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Quantum resistance metrology in graphene

Giesbers, A J M; Rietveld, G; Houtzager, E; Zeitler, U; Yang, R; Novoselov, K S; Geim, A K; Maan, J C

Applied Physics Letters. 2008;93(22).

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Abstract

We performed a metrological characterization of the quantum Hall resistance in a 1 mu m wide graphene Hall bar. The longitudinal resistivity in the center of the nu=+/- 2 quantum Hall plateaus vanishes within the measurement noise of 20 m Omega up to 2 mu A. Our results show that the quantization of these plateaus is within the experimental uncertainty (15 ppm for 1.5 mu A current) equal to that in conventional semiconductors. The principal limitation of the present experiments is the relatively high contact resistances in the quantum Hall regime, leading to a significantly increased noise across the voltage contacts and a heating of the sample when a high current is applied.

Bibliographic metadata

Type of resource:
Content type:
Published date:
Journal title:
ISSN:
Volume:
93
Issue:
22
Digital Object Identifier:
10.1063/1.3043426
ISI Accession Number:
WOS:000261430600041
Related website(s):
  • Related website <Go to ISI>://WOS:000261430600041
General notes:
  • Times Cited: 16
Access state:
Active

Institutional metadata

University researcher(s):

Record metadata

Manchester eScholar ID:
uk-ac-man-scw:146513
Created by:
Hawthornthwaite, Sabina
Created:
9th January, 2012, 16:48:15
Last modified by:
Hawthornthwaite, Sabina
Last modified:
17th January, 2012, 14:33:01

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